Lam Research Enables Next-Generation Memory with Industry’s First ALD Process for Low-Fluorine Tungsten Fill

FREMONT, CA, Aug. 9 (Korea Bizwire) – Lam Research Corp. (NASDAQ: LRCX), an advanced manufacturer of semiconductor equipment, today introduced an atomic layer deposition (ALD) process for depositing low-fluorine-content tungsten films, the latest addition to its industry-leading ALTUS® family of products. With the industry’s first low-fluorine tungsten (LFW) ALD process, the ALTUS Max E Series [...]