SEOUL, Jan. 3 (Korea Bizwire) — A South Korean research team has developed a groundbreaking amorphous semimetal material with properties distinct from traditional metals, paving the way for advancements in next-generation semiconductor technology.
Researchers at Ajou University, led by Professor Oil Kwon of the Department of Intelligent Semiconductor Engineering and Electronics Engineering, announced on January 3 that their international collaboration had successfully created an ultra-thin amorphous semimetal material.
Unlike conventional metals, which experience increased electrical resistivity as their thickness decreases, the new material demonstrates reduced resistivity as it becomes thinner.
A Game-Changer for Semiconductor Manufacturing
The novel material, named topological semimetal, is highly compatible with current semiconductor manufacturing processes. Its low growth temperature, under 400°C, eliminates the need for high-temperature processes, allowing it to be easily integrated into existing systems.
Despite its amorphous structure, which lacks the crystalline properties of traditional thin-film metals, the material retains exceptional conductivity.
This development addresses two critical challenges in adopting new interconnect materials for semiconductors: compatibility with current manufacturing processes and the ability to operate under low-temperature conditions, minimizing potential damage to semiconductor devices.
Toward Commercialization
The research team is now working on developing an atomic layer deposition (ALD) process for the material. ALD, known for its precision in controlling film thickness at the atomic level, is seen as a crucial step toward commercializing this technology for highly miniaturized semiconductor devices.
“This research represents a significant breakthrough, as it experimentally validates a completely new material never attempted before,” said Professor Kwon. “The new material could serve as a game-changing solution for future semiconductor technologies, breaking through the limitations of current materials and offering limitless applications.”
International Collaboration and Recognition
The study, conducted in collaboration with researchers from Stanford University, including Professor Eric Pop and Dr. Asir Intizar Khan, was published in the January issue of the prestigious journal Science under the title “Surface Conduction and Reduced Electrical Resistivity in Ultrathin Non-Crystalline NbP Semimetal.”
Ajou University researchers focused on synthesizing the material and studying its mechanisms and properties, while the Stanford team contributed to material synthesis and the analysis of its electrical characteristics.
This innovation positions South Korea as a leader in developing cutting-edge materials for the semiconductor industry, offering a potential leap forward in addressing the technological challenges of future devices.
Kevin Lee (kevinlee@koreabizwire.com)